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Placheta et al. (2013) Fig. 2. GID-XRD patterns of TiO2 films deposited at 10, 15, 17.5 and 30 % O2/(O2 + Ar) recorded at incidence angles ω: 0.5, 1 and 2°. Positions of reference peaks for identified crystallographic phases, i.e., anatase and rutile, are marked by vertical lines based on ICDD database.

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Figure from łacheta, K., Kot, A., Banas-Gac, J., Zając, M., Sikora, M., Radecka, M. and Zakrzewska, K., 2023. Evolution of surface properties of titanium oxide thin films. Applied Surface Science, 608, p.155046. Used under Creative Common license.
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