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X-ray reflectometry (XRR) measurement on atomic layer deposition (ALD) Ru layer and
corresponding simulation with a simple two-layer model (substrate + Ru thin film). Figure 1 from Müller et al., 2018.

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Last Modified: 2024-04-05 15:56:27
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Figure 1 from: Müller, R., Ghazaryan, L., Schenk, P., Wolleb, S., Beladiya, V., Otto, F., Kaiser, N., Tünnermann, A., Fritz, T. and Szeghalmi, A., 2018. Growth of atomic layer deposited ruthenium and its optical properties at short wavelengths using Ru (EtCp) 2 and oxygen. Coatings, 8(11), p.413.
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